纺织学报 ›› 2022, Vol. 43 ›› Issue (09): 195-202.doi: 10.13475/j.fzxb.20210608908

• 综合述评 • 上一篇    下一篇

原子层沉积在纺织品表面多功能改性研究进展

杨辉宇1,2, 周敬伊1, 段子健1, 徐卫林1, 邓波1, 刘欣1()   

  1. 1.武汉纺织大学 省部共建纺织新材料与先进加工技术国家重点实验室, 湖北 武汉 430200
    2.湖北工程学院 化学与材料科学学院, 湖北 孝感 432000
  • 收稿日期:2021-06-30 修回日期:2022-06-02 出版日期:2022-09-15 发布日期:2022-09-26
  • 通讯作者: 刘欣
  • 作者简介:杨辉宇(1991—),男,博士生。主要研究方向为纤维材料表面功能化改性。
  • 基金资助:
    国家自然科学基金项目(52173062);国家自然科学基金项目(51773158);湖北省重点研发计划项目(2020BAB080);湖北省中央引导地方科技发展专项(2019ZYYD077)

Research progress in textile surface multifunctional modification by atomic layer deposition

YANG Huiyu1,2, ZHOU Jingyi1, DUAN Zijian1, XU Weilin1, DENG Bo1, LIU Xin1()   

  1. 1. State Key Laboratory of New Textile Materials and Advanced Processing Technologies, Wuhan Textile University, Wuhan, Hubei 430200, China
    2. School of Chemistry and Materials Science, Hubei Engineering University, Xiaogan, Hubei 432000, China
  • Received:2021-06-30 Revised:2022-06-02 Published:2022-09-15 Online:2022-09-26
  • Contact: LIU Xin

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摘要：

针对无机纳米薄膜在制备多功能纺织品时,易出现纳米粒子团聚、薄膜稳定性差以及纤维强度和柔软性降低等问题,针对性地开发具有超薄可控、高界面结合牢度和稳定性优异的无机纳米薄膜是提升纺织品多功能化的有效途径。首先阐述了原子层沉积(ALD)的反应机制和制备无机纳米薄膜的独特优势;然后综述了当前国内外经ALD制备的无机纳米薄膜赋予纺织品表面抗紫外线、隔热保温、抗菌以及结构色等功能特性的研究进展,并对比分析了ALD与化学气相沉积的优缺点,总结了ALD在纺织品功能化应用中面临的挑战和问题,最后指出用ALD制备无机纳米薄膜技术是多功能纺织品的重要发展方向。

关键词: 原子层沉积, 功能性纺织品, 无机纳米薄膜, 表面改性, 化学气相沉积

Abstract:

In order to tackle the nano-particle agglomeration, poor film stability, and reduced fiber mechanical strength and flexibility when preparing multifunctional textiles from inorganic nano-films, one route is to treat the textile surface using inorganic nano-films with ultra-thin, high interfacial bonding fastness, and high-stability. This review summarizes the reaction mechanism of atomic layer deposition (ALD) and the unique advantages of preparing inorganic nano-films. The current global research progress in inorganic nano-films deposited by ALD to impart functional properties such as ultraviolet resistance, thermal insulation, antibacterial and structural color on the surface of textiles were reviewed. The advantages and disadvantages of ALD and chemical vapor deposition are compared and analyzed. The challenges and problems of ALD in the application of textile functionalization were summarized. It was pointed out that the preparation of inorganic nano-films by ALD represents an important development direction of multifunctional textiles.

Key words: atomic layer deposition, functional textiles, inorganic nano-film, surface modification, chemical vapor deposition

中图分类号: 

  • TS101

图1

经ALD在织物上沉积Al2O3的化学反应机制"

表1

原子层沉积工艺特点、优势和局限性"

工艺特点 优势 局限性
自限制表面生长 精确简单的膜厚控制;优异的三维共形性和大面积均匀性;致密无针孔薄膜;较低的生长温度 低生长速率;薄膜具有较低的结晶度或无定形态;多余前驱体的处理和污染环境
交替脉冲输入反应物 避免气相反应,可使用高活性前驱体;单原子层调控;适合界面修饰和多层重叠结构生长 前驱体的种类少、杂质残余
ALD 窗口设计 多种薄膜层制备、掺杂、循环调控 三元和复杂氧化物设计缺乏

表2

原子层沉积和化学气相沉积的特点对比"

影响因素 原子层沉积 化学气相沉积
前驱体 高反应活性;可在基材上交替反应;可接受过量前驱体;反应温度下不可分解 反应活性低;基材表面同时反应;前驱体的用量需控制;沉积温度下可分解
均匀性 由表面化学吸附、自限制反应机制生长决定 由反应室、气流和温度等工艺参数决定
反应速率 较低(纳米级生长) 高(微米级生长)
厚度 取决于反应循环次数 调控工艺参数
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