Abstract: A magnetron sputter coating was used in this study to deposit zinc oxide(ZnO) nanostructure film onto the nonwoven substrate.Atomic force microscopy(AFM) was employed to analyze the effect of RF magnetron sputtering parameters (power,pressure,time) on the microstructure of transparent ZnO film built on the nonwoven substrate.The transmittance of samples was examined by an UV/VIS spectrophotometer.The results demonstrated that increasing the coating time increases the evenness and compactness of the film.Higher power used accelerates the growth of the film,however,too high a power is not recommended.Excessive working pressure results in the deformation of the grown ZnO grains on the fiber surface.The nonwoven substrate exhibits much better UV absorption as the coat thickness increases.