Journal of Textile Research ›› 2022, Vol. 43 ›› Issue (08): 88-94.doi: 10.13475/j.fzxb.20210506307

• Dyeing and Finishing & Chemicals • Previous Articles     Next Articles

Construction of highly stable photonic crystals on textile substrates with asymmetric wetting characteristics

ZHANG Xingyue1, HAN Pengshuai1, WANG Yimeng2, ZHANG Yunxiao2, ZHOU Lan1,3, LIU Guojin1,2()   

  1. 1. Key Laboratory of Advanced Textile Materials and Manufacturing Technology, Ministry of Education, Zhejiang Sci-Tech University, Hangzhou, Zhejiang 310018, China
    2. Zhejiang Provincial Key Laboratory of Fiber Materials and Manufacturing Technology, Zhejiang Sci-Tech University, Hangzhou, Zhejiang 310018, China
    3. Zhejiang Provincial Key Laboratory of Green Cleaning Technology and Washing Products, Lishui, Zhejiang 323000, China
  • Received:2021-05-24 Revised:2022-05-17 Online:2022-08-15 Published:2022-08-24
  • Contact: LIU Guojin E-mail:guojin900618@163.com

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Abstract:

In order to improve the durability of structural colors produced from photonic crystals on textile substrates, a printing paste was prepared considering printing paste performance and substrate wettability, with self-crosslinking poly(styrene–N–hydroxymethylacrylamide) (P(St-NMA)) colloidal microspheres as the main component. Screen printing method was used to construct the highly stable photonic crystals on textile substrates with asymmetric wetting characteristics. The stability of photonic crystal chromogenic structure on textile substrate was tested. The results show that when the concentration of microspheres in printing paste is 80％ and the concentration of self-crosslinking accelerator hydrochloric acid is 5％–10％, photonic crystals with bright color and stable structure are obtained. The asymmetric wetting characteristics of the substrate can be achieved by plasma technology. When the treatment time is 3 min, the textile substrates with face and back contact angles of 56° and 110° can be obtained respectively, and photonic crystals with both structural color effect and structural stability can be constructed on the substrate face.

Key words: asymmetric wetting, textile substrate, screen printing, photonic crystal, structural color

CLC Number: 

  • TS193.2

Fig.1

Typical FESEM image (a) and TEM image (b) of P (St-NMA) colloidal microspheres"

Fig.2

Digital camera photos, 3-D microscope images and FESEM images of printing patterns of photonic crystals structure prepared by self-assembly of P(St-NMA) microspheres with different concentrations on surface of cotton fabrics"

Fig.3

Digital camera photos, 3-D microscope images and FESEM images of printing patterns produced from photonic crystals on surface of cotton fabrics with printing paste containing different concentrations of hydrochloric acid"

Fig.4

Digital camera photos and 3-D microscope images of structural color printed fabric before and after friction. (a) P(St-NMA) microspheres; (b) P(St-NMA) microspheres added with HCl"

Fig.5

Contact angles (a)and printing patterns (b) of fabrics after plasma treatment at different time"

Fig.6

3-D microscope images and FESEM images of printing pattern photos after plasma treatment at different time"

Fig.7

FESEM images of printed pattern on fabric after plasma treatment at different time after stripping"

Fig.8

Bending test process (a) and 3-D microscope images before and after bending (b)of structural color printed fabrics (microsphere size 254 nm)"

Fig.9

Digital camera photos and 3-D microscope images of structural color printed fabrics before (a) and after (b) ultrasonic washing(microsphere size 254 nm)"

Fig.10

Photos of structural color printed fabric samples obtained from printing pastes with different particle sizes"

Fig.11

Reflectance curves of structural color printed fabric samples obtained by colloidal microspheres with different particle sizes"

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