JOURNAL OF TEXTILE RESEARCH ›› 2007, Vol. 28 ›› Issue (1): 124-128.
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YANG Yunchu;ZHANG Weiyuan;LIU Li
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Abstract: The paper outlines two routes to digital pattern design for customized garment: pattern design technology of 2-D CAD system and flattening technology based on 3-D garment model,presents their principle,applications,advantages and disadvantages.The former technolgy include three methods: pattern altering based on grading technique,pattern auto-making based on parametric design and pattern generating based on artificial intelligence.The latter technology include three methods: geometric flattening,mechanical flattening and geometric flattening-mechanical amendment.
YANG Yunchu;ZHANG Weiyuan;LIU Li. Exploring of digital garment pattern design based on mass customization[J].JOURNAL OF TEXTILE RESEARCH, 2007, 28(1): 124-128.
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