Journal of Textile Research ›› 2016, Vol. 37 ›› Issue (4): 165-169.

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Research progress of magnetron sputtering in textiles

  

  • Received:2015-02-13 Revised:2015-12-05 Online:2016-04-15 Published:2016-04-07

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Abstract:

As a kind of sputtering technology with high deposition rates and low substrate temperatures, magnetron sputtering provides a new method for the surface modification of textiles. First, the methods of films formed on the textile and the principle of magnetron sputtering are introduced. Then this article reviews the research progress on development of antibacterial, conductive, electromagnetic shielding, UV proof, waterproof and moisture-permeable and other functional fabrics prepared by magnetron sputtering in details and discusses the application of the technology in dying process. Finally, the existing problems in the magnetron sputtering process are summarized.  Ag, Cu, Sn, Ni, TiO2, poly(tetrafluoroethylene)(PTFE) and other materials can be deposited on the surface of textiles by magnetron sputtering. Compare with other method, magnetron sputtering is more efficiency and environment friendly and the prepared film is not easy to crack.

Key words: magnetron sputtering, functional textile, coated dyeing

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