JOURNAL OF TEXTILE RESEARCH ›› 2007, Vol. 28 ›› Issue (1): 124-128.

• 综合述评 • Previous Articles    

Exploring of digital garment pattern design based on mass customization

YANG Yunchu;ZHANG Weiyuan;LIU Li   

  1. 1.Fashion Institute;Donghua University;Shanghai 200051;China;(2.Beijing University of Clothing Technology;Beijing 100029;China
  • Received:2006-03-24 Revised:2006-06-26 Online:2007-01-15 Published:2007-01-15

Abstract: The paper outlines two routes to digital pattern design for customized garment: pattern design technology of 2-D CAD system and flattening technology based on 3-D garment model,presents their principle,applications,advantages and disadvantages.The former technolgy include three methods: pattern altering based on grading technique,pattern auto-making based on parametric design and pattern generating based on artificial intelligence.The latter technology include three methods: geometric flattening,mechanical flattening and geometric flattening-mechanical amendment.

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